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Susumu’s fine patterning capability using photolithography enables them to create resistive patterns as narrow as 10µm. For example, in order to create 2 MOhm RG3216, the designer uses relatively lower sheet resistance and a resistive pattern as narrow as 14µm. For 5 MOhm RG3216, the designer uses higher Ohms per square and 10µm pattern width.
PTM Published on: 2017-05-23
